Date：2026-01-16 Categories：Product knowledge Hits：149 From：Guangdong Youfeng Microelectronics Co., Ltd
Inductively Coupled Plasma (ICP) is a commonly used plasma source widely applied in mass spectrometry, spectroscopy, surface treatment, and other fields. The ICP plasma transfers radiofrequency energy to the gas through inductive coupling, exciting it into a plasma state. It features high temperature and high energy, generating a rich variety of active species. Below is a more detailed explanation of ICP plasma, its principles, advantages, and applications in various fields diode
The principle of ICP plasma:
The ICP plasma primarily consists of an RF power source, a DS90C365AMT antenna coil, and a reaction chamber. The RF power source generates a high-frequency electric field, which transmits energy to the reaction chamber through the antenna coil, causing inert gases or gas mixtures to form a plasma state. Under the influence of the high-frequency alternating electric field, the plasma oscillates, leading to ionization and excitation reactions of atoms and molecules in the gas.diode
2. Characteristics of ICP plasma:
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